TFD Materials Inc is professional in thin film depostion materials.1.) Oxide sputtering target: CeO2, Nd2O3, Sm2O3, Eu2O3, Gd2O3, Tb4O7, Dy2O3, Ho2O3, Er2O3, Tm2O3, Yb2O3, Lu2O3, Sc2O3, Y2O3, Ta2O5, Ta2Ox, Nb2O5, Nb2Ox Ga2O3, V2O5, VO2, ZrO2 doped with Ti, WO3, WO2.9, HfO2, MgO, Al2O3, In2O3, Indium Tin Oxide, ITO (In2O3-SnO2), In2O3/CaO, ZnO, Al2O3 doped ZnO (AZO), IZO (Indium Zinc Oxide, 90 wt% In2O3 / 10 wt% ZnO), In2O3/CaO ICO, Li2O/ZnO LZO, Ga2O3 doped ZnO (GZO), IGZO, ZnO2/TiO2, Zn...View More