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Aluminum oxide (Al2O3) optical thin film coating material, CAS 1344-28-1
$ 50.00 -
Tantalum pentoxide (Ta2O5) sputtering targets CAS 1314-61-0
$ 100.00 -
Cuprous Oxide (Cu2O, CuO) targets CAS 1317-39-1 and 1317-38-0
$ 100.00 -
Indium Tin oxide (In2O3-SnO2) ITO sputtering target CAS 50926-11-9
$ 200.00 -
Aluminum Zinc oxide (AZO) sputtering targets CAS 1314-13-2 and and 1344-28-1
$ 200.00 -
Zinc Oxide (ZnO) sputtering targets, Purity: 99.99%, CAS: 1314-13-2
$ 200.00 -
Barium Zirconium Yttrium Oxide (BaZrYO3) sputtering targets
$ 200.00 -
Barium Strontium Titanate (BaSrTiO3) sputtering targets use in thin film coating
$ 200.00 -
Indium oxide (In2O3) sputtering target use in thin film coating CAS 1312-43-2
$ 200.00 -
Tungsten oxide (WO3,WO2.9) sputtering targets, Purity: 99.95%, CAS 1314-35-8
$ 200.00 -
Hafnium oxide (HfO2) sputtering target CAS 12055-23-1
$ 200.00 -
Aluminum oxide (Al2O3) sputtering target use in thin film coating CAS 1344-28-1
$ 200.00 -
Cobalt oxide (Co3O4) target use in thin film coating CAS 1308-06-01
$ 200.00 -
Iron oxide (Fe3O4, Fe2O3) targets use in thin film coating CAS 1332-37-2
$ 200.00 -
Molybdenum trioxide (MoO3) target use in thin film coating CAS 1313-27-5
$ 200.00 -
Silicon monoxide (SiO) target use in thin film coating CAS 10097-28-6
$ 200.00 -
Silicon dioxide (SiO2) targets use in thin film coating CAS 60676-86-0
$ 200.00 -
Tin oxide (SnO2, SnO) sputtering targets, purity: 99.9%, CAS: 18282-20-5
$ 200.00 -
Titanium oxide (TiO2) sputtering targets, purity: 99.99%, CAS: 13463-67-7
$ 200.00
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