Silicon monoxide (SiO) target use in thin film coating

 Purity 99.9%

Shape: Discs, disks, step disk, delta, plate, sheets or made per drawing

Diameter: 355.6mm (14") max.

Single piece Size: Length: <500mm, Width: <250mm, Thickness: >1mm, if larger size than this, we can do it as Tiles joint by 45 degree or 90 degree

Made sputtering targets method: hot pressing (HP), hot/cold isostatic pressing (HIP, CIP), and vacuum melting, vacuum sintering

Used for optical glass and semiconductor materials preparation. In the vacuum will be evaporation, besmear in the optical instruments with metal mirror reflection, as a protective film. The preparation of semiconductor materials​​