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Aluminum Nickel (Al-Ni) alloy sputtering targets CAS 7429-90-5 and 7440-02-0picture1

Aluminum Nickel (Al-Ni) alloy sputtering targets CAS 7429-90-5 and 7440-02-0

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Order Quantity:
1 Set / Sets
Supply Ability:
1000 Set / Sets per Month
Port:
shanghai
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Delivery Detail:
5 days
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Product Details

Aluminum Nickel (Al-Ni) alloy sputtering targets use in evaporation or thin film coating

purity: 99.9%

Composition:   Al/Ni=3/1at  and Al/Ni=1/1at   or made by request

Size: max. 355.6mm (14 inch) ,

Length: 500mm max x Width 200mm x thickness 20mm max.,

Shape: Discs, disks, rod, step disk, delta, plate, sheets or made per drawing

 

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