Silicon Nitride Si3N4 sputtering targets use in thin film coating CAS 12033-89-5

 Silicom Nitride (Si3N4) ceramic sputtering target

Purity: 99.5%

Size: Diameter: 355.6mm (14") max.

Single piece Size: Length: <350mm, Width: <250mm, Thickness: >1mm,

if larger size than this, we can do it as Tiles joint by 45 degree or 90 degree

Shape: discs, plate, rod, tube, sheet, Delta, Rotatable and per drawing

Molar mass: 140.28 g·mol−1
Appearance: grey, odorless powder
Density: 3.2 g/cm3, solid
Melting point: 1,900 °C; 3,452 °F; 2,173 K (decomposes)

Silicon nitride is a chemical compound of the elements silicon and nitrogen, with the formula Si3N4. It is a white, high-melting-point solid that is relatively chemically inert, being attacked by dilute HF and hot H2SO4. It is very hard (8.5 on the mohs scale). It is the most thermodynamically stable of the silicon nitrides. Hence, Si3N4 is the most commercially important of the silicon nitrides and is generally understood as what is being referred to where the term "silicon nitride" is used.

Applications:

1. Automobile industry

2. Bearings

3. High-temperature material

4. Medical

5. metal working and cutting tools

6. Electronics

We also supplying other nitride targets material as following:

Aluminum Nitride , AlN target

Boron Nitride, BN target

Hafnium Nitride, HfN target

Niobium Niride , NbN target

Silicom Nitride , Si3N4 target

Tantalum Nitride , TaN target

Titanium Carbon nitride , TiCN target

Titanium Nitride, TiN target

​Tungsten Nitride, WN targets

Vanadium Nitride , VN target

Zirconium Nitride , ZrN target