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Silicon monoxide (SiO) target use in thin film coating
Purity 99.9%
Shape: Discs, disks, step disk, delta, plate, sheets or made per drawing
Diameter: 355.6mm (14") max.
Single piece Size: Length: <500mm, Width: <250mm, Thickness: >1mm, if larger size than this, we can do it as Tiles joint by 45 degree or 90 degree
Made sputtering targets method: hot pressing (HP), hot/cold isostatic pressing (HIP, CIP), and vacuum melting, vacuum sintering
Used for optical glass and semiconductor materials preparation. In the vacuum will be evaporation, besmear in the optical instruments with metal mirror reflection, as a protective film. The preparation of semiconductor materials
| The Company | TYR TECH MATERIAL LIMITED |
| The contact | Amy Qiu |
| The Address | No. 4 room, 1st floor, 6th.building of LuFuGongGuan, Jin Hua road,Huizhou,China |
| The Website | https://www.alibobo.com/com/tyrtec/ |
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inquiry
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Silicon monoxide (SiO) target use in thin film coating CAS 10097-28-6
Response Rate: High
Avg Response Time: 24–48 h
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