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Silicon dioxide (SiO2) sputtering targets
Purity 99.995%
Shape: Discs, disks, step disk, delta, plate, sheets or made per drawing
Diameter: 355.6mm (14") max.
Single piece Size: Length: <500mm, Width: <250mm, Thickness: >1mm, if larger size than this, we can do it as Tiles joint by 45 degree or 90 degree
Made sputtering targets method: hot pressing (HP), hot/cold isostatic pressing (HIP, CIP), and vacuum melting, vacuum sintering
To make glass ceramics, abrasion agent, oil bleaching and purification ferrosilicon, determination boron, arsenic and silver, etc. Thin layer chromatography analysis with the board.
| The Company | TYR TECH MATERIAL LIMITED |
| The contact | Amy Qiu |
| The Address | No. 4 room, 1st floor, 6th.building of LuFuGongGuan, Jin Hua road,Huizhou,China |
| The Website | https://www.alibobo.com/com/tyrtec/ |
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inquiry
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Silicon dioxide (SiO2) targets use in thin film coating CAS 60676-86-0
Response Rate: High
Avg Response Time: 24–48 h
Business Type:
