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Silicon dioxide (SiO2) targets use in thin film coating CAS 60676-86-0

$200.00

1/pc (MOQ)
FOB Price:
Negotiable | Get Latest Price
Min.Order Quantity:
1 Set / Sets
Supply Ability:
1000 Set / Sets per Month
Port:
shanghai
Payment Terms:
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Delivery Detail:
5 days

 Silicon dioxide (SiO2) sputtering targets

Purity 99.995%

Shape: Discs, disks, step disk, delta, plate, sheets or made per drawing

Diameter: 355.6mm (14") max.

Single piece Size: Length: <500mm, Width: <250mm, Thickness: >1mm, if larger size than this, we can do it as Tiles joint by 45 degree or 90 degree

 

Made sputtering targets method: hot pressing (HP), hot/cold isostatic pressing (HIP, CIP), and vacuum melting, vacuum sintering

 To make glass ceramics, abrasion agent, oil bleaching and purification ferrosilicon, determination boron, arsenic and silver, etc. Thin layer chromatography analysis with the board.

 

Contact with Supplier
The CompanyTYR TECH MATERIAL LIMITED
The contactAmy Qiu
The AddressNo. 4 room, 1st floor, 6th.building of LuFuGongGuan, Jin Hua road,Huizhou,China
The Websitehttps://www.alibobo.com/com/tyrtec/
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Silicon dioxide (SiO2) targets use in thin film coating CAS 60676-86-0

Quantity
0 Piece
Products Cost
$200.00
Area
ChinaGuang Dong
TYR TECH MATERIAL LIMITED
ChinaGuang Dong 1Years

Response Rate: High

Avg Response Time: 24–48 h

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