Titanium diboride TiB2 targets use in RF sputtering CAS 12045-63-5

Titanium diboride (TiB2) sputtering target

Purity: 99.5%

Shape: Discs, disks, step disk, delta, plate, sheets or made per drawing

Diameter: 355.6mm (14") max.

Single piece Size: Length:<500mm, Width: <250mm, thickness:="">1mm, if larger size than this, we can do it as Tiles joint by 45 degree or 90 degree

Made sputtering targets method: hot pressing (HP), hot/cold isostatic pressing (HIP, CIP), and vacuum melting, vacuum sintering

Titanium diboride (TiB2) is an extremely hard ceramic which has excellent heat conductivity, oxidation stability and resistance to mechanical erosion. TiB2 is also a reasonable electrical conductor, so it can be used as a cathode material in aluminium smelting and can be shaped by electrical discharge machining.

Molar mass: 69.489 g/mol
Appearance: non lustrous metallic grey
Density: 4.52 g/cm3
Melting point: 3,230 °C (5,850 °F; 3,500 K)

Please feel free contact us with any special requirements at any times, we will get back for you ASAP.